Contribution of Si/SiO2 Interface Roughness in the Observation of Chemical Structure

Kenji Ishikawa; Hiroki Ogawa; Carlos Inomata; Shuzo Fujimura

doi:10.7567/ssdm.1994.c-8-5

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Contribution of Si/SiO2 Interface Roughness in the Observation of Chemical Structure

Kenji Ishikawa Hiroki Ogawa Carlos Inomata Shuzo Fujimura

Year: 1994

DOI: 10.7567/ssdm.1994.c-8-5

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Keywords:

Materials science Interface (matter) Surface finish Surface roughness Engineering physics Optoelectronics Nanotechnology Composite material Engineering

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Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Surface Roughness and Optical Measurements

Physical Sciences → Engineering → Computational Mechanics

Contribution of Si/SiO2 Interface Roughness in the Observation of Chemical Structure

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