JOURNAL ARTICLE

Improving source efficiency for aluminum nitride grown by metal organic chemical vapor deposition

Humberto M. ForondaMatthew A. LaurentBenjanim YonkeeS. KellerSteven P. DenBaarsJames S. Speck

Year: 2016 Journal:   Semiconductor Science and Technology Vol: 31 (8)Pages: 085003-085003   Publisher: IOP Publishing

Abstract

This work was supported by the King Abduallah Center for Science and Technology-King Abdullah University of Science and Technology-University of California, Santa Barbara Solid State Lighting Program (KACST-KAUST-UCSB SSLP). The authors would like to the Materials Research Laboratory (MRL), California Nanosystems Institute (CNSI), and the Nanofabrication facility at UC Santa Barbara for providing access and training to their laboratories.

Keywords:
Chemical vapor deposition Nitride Aluminium Metal Deposition (geology) Chemistry Environmental chemistry Materials science Chemical engineering Inorganic chemistry Nanotechnology Metallurgy Geology Layer (electronics)

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7
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0.39
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28
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0.71
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Citation History

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