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JOURNAL ARTICLE

Very high frequency plasma reactant for atomic layer deposition

Il‐Kwon Oh Gilsang Yoo Chang Mo Yoon Tae Hyung Kim Geun Young Yeom Kangsik Kim Zonghoon Lee Hanearl Jung Chang Wan Lee Hyungjun Kim Han‐Bo‐Ram Lee

Year: 2016 Journal: Applied Surface Science Vol: 387 Pages: 109-117 Publisher: Elsevier BV

DOI: 10.1016/j.apsusc.2016.06.048

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Keywords:

Atomic layer deposition Plasma Dielectric Materials science High-κ dielectric Optoelectronics Ion Plasma cleaning Radio frequency Deposition (geology) Analytical Chemistry (journal) Layer (electronics) Nanotechnology Chemistry Electrical engineering

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20

Cited By

1.12

FWCI (Field Weighted Citation Impact)

59

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0.83

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Ferroelectric and Negative Capacitance Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

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