JOURNAL ARTICLE

Very high frequency plasma reactant for atomic layer deposition

Keywords:
Atomic layer deposition Plasma Dielectric Materials science High-κ dielectric Optoelectronics Ion Plasma cleaning Radio frequency Deposition (geology) Analytical Chemistry (journal) Layer (electronics) Nanotechnology Chemistry Electrical engineering

Metrics

20
Cited By
1.12
FWCI (Field Weighted Citation Impact)
59
Refs
0.83
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Ferroelectric and Negative Capacitance Devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

Related Documents

JOURNAL ARTICLE

Atomic Layer Deposition of Co Using N2∕H2 Plasma as a Reactant

Jaehong YoonHan‐Bo‐Ram LeeDoyoung KimTaehoon CheonSoo‐Hyun KimHyungjun Kim

Journal:   Journal of The Electrochemical Society Year: 2011 Vol: 158 (11)Pages: H1179-H1179
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