Photoinduced Selective Deposition of Aluminium Thin Film Using Dimethylaluminum Hydride

Mitsugu Hanabusa; Hideki Ouchi; Kenji Ishida; Masahiro Kawasaki; Satoshi Shogen

doi:10.1557/proc-236-85

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Photoinduced Selective Deposition of Aluminium Thin Film Using Dimethylaluminum Hydride

Mitsugu Hanabusa Hideki Ouchi Kenji Ishida Masahiro Kawasaki Satoshi Shogen

Year: 1991 Journal: MRS Proceedings Vol: 236 Publisher: Cambridge University Press

DOI: 10.1557/proc-236-85

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Keywords:

Materials science Silicon Substrate (aquarium) X-ray photoelectron spectroscopy Aluminium Hydride Thin film Deposition (geology) Inorganic chemistry Chemical engineering Photochemistry Metal Nanotechnology Optoelectronics Metallurgy Chemistry

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GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photoinduced Selective Deposition of Aluminium Thin Film Using Dimethylaluminum Hydride

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