Soft-Landing Deposition of Al₁₇⁻ on a Hydroxyl-Terminated Self-Assembled Monolayer

Abstract

Small aluminum clusters (<30 atoms) have been the subject of extensive study, demonstrating markedly different properties as even a single atom is added or removed. Successfully depositing and characterizing mass-selected clusters are the next steps in producing precise surfaces or cluster-assembled materials that demonstrate properties that differ from those of bulk materials. This proves to be difficult due to the reactivity of these all-metal clusters and their susceptibility to agglomerate in bulk form. In the present study, we have successfully deposited Al17− onto self-assembled monolayers using reactivity previously characterized in the gas phase.