Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching

李艳娜 LI Yan-na; 陈涛 Chen Tao; 潘安 Pan An; 司金海 Si Jinhai; 侯洵 Hou Xun

doi:10.3788/cjl201542.0103007

ScienceGate Book Chapters

JOURNAL ARTICLE

Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching

李艳娜 LI Yan-na 陈涛 Chen Tao 潘安 Pan An 司金海 Si Jinhai 侯洵 Hou Xun

Year: 2015 Journal: Chinese Journal of Lasers Vol: 42 (1)Pages: 0103007-0103007 Publisher: Science Press

DOI: 10.3788/cjl201542.0103007

Get Full-Text PDF Get Analytical Report

Keywords:

Femtosecond Materials science Etching (microfabrication) Fabrication Silicon Irradiation Laser Aspect ratio (aeronautics) Optoelectronics Isotropic etching Optics Nanotechnology Layer (electronics)

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.15

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Fabrication of High-Aspect-Ratio All-Silicon Grooves Using Femtosecond Laser Irradiation and Wet Etching

Metrics

Topics

Related Documents

Parallel fabrication of high-aspect-ratio all-silicon grooves using femtosecond laser irradiation and wet etching

Fabrication of high-aspect-ratio grooves in silicon using femtosecond laser irradiation and oxygen-dependent acid etching

Fabrication of Micro-Grooves in Silicon Carbide Using Femtosecond Laser Irradiation and Acid Etching

Study on morphology of high-aspect-ratio grooves fabricated by using femtosecond laser irradiation and wet etching

Fabrication of high-aspect-ratio grooves with high surface quality by using femtosecond laser