JOURNAL ARTICLE

Atomic Layer Deposition of Hafnium Oxide Thin Films from Tetrakis(dimethylamino)Hafnium (TDMAH) and Ozone

Xinye LiuSasangan RamanathanThomas E. Seidel

Year: 2003 Journal:   MRS Proceedings Vol: 765   Publisher: Cambridge University Press
Keywords:
Hafnium Materials science Atomic layer deposition Saturation (graph theory) Susceptor Volatilisation Dielectric Analytical Chemistry (journal) Wafer Deposition (geology) Thin film Chemical vapor deposition Layer (electronics) Optoelectronics Nanotechnology Metallurgy Zirconium Environmental chemistry Epitaxy Chemistry

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Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
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