JOURNAL ARTICLE
Atomic Layer Deposition of Hafnium Oxide Thin Films from Tetrakis(dimethylamino)Hafnium (TDMAH) and Ozone
Xinye LiuSasangan RamanathanThomas E. Seidel
Year: 2003 Journal: MRS Proceedings Vol: 765 Publisher: Cambridge University Press
Keywords:
Hafnium Materials science Atomic layer deposition Saturation (graph theory) Susceptor Volatilisation Dielectric Analytical Chemistry (journal) Wafer Deposition (geology) Thin film Chemical vapor deposition Layer (electronics) Optoelectronics Nanotechnology Metallurgy Zirconium Environmental chemistry Epitaxy Chemistry
Metrics
11
Cited By
0.00
FWCI (Field Weighted Citation Impact)
4
Refs
0.25
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Advancements in Semiconductor Devices and Circuit Design
Physical Sciences → Engineering → Electrical and Electronic Engineering
Integrated Circuits and Semiconductor Failure Analysis
Physical Sciences → Engineering → Electrical and Electronic Engineering
Related Documents
JOURNAL ARTICLE
Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water
Kaupo KukliTero PilviMikko RitalaTimo SajavaaraJun LuMarkku Leskelä
Journal: Thin Solid Films Year: 2005 Vol: 491 (1-2)Pages: 328-338
JOURNAL ARTICLE
ALD of Hafnium Oxide Thin Films from Tetrakis(ethylmethylamino)hafnium and Ozone
Xinye LiuSasangan RamanathanAna LongderganAnuranjan SrivastavaEddie LeeThomas E. SeidelJeffrey BartonDawen PangRoy G. Gordon
Journal: Journal of The Electrochemical Society Year: 2005 Vol: 152 (3)Pages: G213-G213
JOURNAL ARTICLE
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
Yoshihide SenzakiSeung ParkHood ChathamLawrence BartholomewWesley Nieveen
Journal: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Year: 2004 Vol: 22 (4)Pages: 1175-1181
JOURNAL ARTICLE
Atomic Layer Deposition of Hafnium Oxide from Tetrakis(ethylmethylamino)hafnium and Water Precursors
Wei ChenQingqing SunMin XuShi‐Jin DingDavid Wei ZhangLi-Kang Wang
Journal: The Journal of Physical Chemistry C Year: 2007 Vol: 111 (17)Pages: 6495-6499
JOURNAL ARTICLE
Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water
Kaupo KukliMikko RitalaTimo SajavaaraJ. KeinonenMarkku Leskelä
Journal: Chemical Vapor Deposition Year: 2002 Vol: 8 (5)Pages: 199-204