Preparation and properties of CuCr1−xFexO2 thin films prepared by chemical solution deposition with two-step annealing

Te‐Wei Chiu; Jin-Han Shih; Chih‐Hao Chang

doi:10.1016/j.tsf.2016.03.048

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Preparation and properties of CuCr1−xFexO2 thin films prepared by chemical solution deposition with two-step annealing

Te‐Wei Chiu Jin-Han Shih Chih‐Hao Chang

Year: 2016 Journal: Thin Solid Films Vol: 618 Pages: 151-158 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2016.03.048

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Keywords:

Delafossite Thin film Annealing (glass) Materials science Copper Band gap Chromium Carbon film Transmittance Chemical engineering Chemical bath deposition Doping Analytical Chemistry (journal) Oxide Nanotechnology Metallurgy Optoelectronics Chemistry Organic chemistry

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Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Preparation and properties of CuCr1−xFexO2 thin films prepared by chemical solution deposition with two-step annealing

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