Progress of Optical Maskless Lithography Based on Spatial Light Modulator

马延琴 Ma Yanqin; 杜惊雷 Du Jinglei

doi:10.3788/lop49.070006

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JOURNAL ARTICLE

Progress of Optical Maskless Lithography Based on Spatial Light Modulator

马延琴 Ma Yanqin 杜惊雷 Du Jinglei

Year: 2012 Journal: Laser & Optoelectronics Progress Vol: 49 (7)Pages: 070006-070006

DOI: 10.3788/lop49.070006

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Keywords:

Spatial light modulator Maskless lithography Lithography Materials science Optics Optoelectronics Nanotechnology Physics Electron-beam lithography

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Topics

Advanced Optical Imaging Technologies

Physical Sciences → Engineering → Media Technology

Optical Systems and Laser Technology

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced optical system design

Physical Sciences → Engineering → Biomedical Engineering

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