JOURNAL ARTICLE
Growth and Composition of LPCVD Silicon Oxynitride Films
F.H.P.M. HabrakenA. E. T. Kuiper
Year: 1985 Journal: MRS Proceedings Vol: 48 Publisher: Cambridge University Press
Keywords:
Electronegativity Silicon oxynitride Materials science Chemical vapor deposition Oxygen Silicon Nitrogen Partial pressure Chemical composition Deposition (geology) Chemical engineering Analytical Chemistry (journal) Nanotechnology Metallurgy Silicon nitride Chemistry Organic chemistry
Metrics
3
Cited By
0.00
FWCI (Field Weighted Citation Impact)
8
Refs
0.25
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Topics
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Ion-surface interactions and analysis
Physical Sciences → Engineering → Computational Mechanics
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