JOURNAL ARTICLE

Three-axis force-torque sensor with fully differential capacitive readout

Abstract

We present a 3-axis force/torque sensor fabricated in a single SOI wafer. The sensor allows fully differential capacitive readout also for the normal force measurement, without the need for complicated lever mechanisms or wafer bonding. Fabrication is straightforward, with only two masks for deep reactive ion etching and one release etch. Furthermore, out-of-plane displacements are limited by the buried oxide layer thickness which allows for overload protection. The chip has a diameter of 5 mm, a normal force range of 1 N and a torque range from -4 to +4 Nmm and is designed for measuring the interaction forces involved in eye surgery.

Keywords:
Capacitive sensing Torque Wafer Materials science Fabrication Lever Deep reactive-ion etching Optoelectronics Etching (microfabrication) Silicon on insulator Electrical engineering Layer (electronics) Physics Reactive-ion etching Engineering Mechanical engineering Nanotechnology Silicon

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9
Cited By
0.96
FWCI (Field Weighted Citation Impact)
8
Refs
0.80
Citation Normalized Percentile
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Citation History

Topics

Advanced MEMS and NEMS Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Mechanical and Optical Resonators
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Electronic and Structural Properties of Oxides
Physical Sciences →  Materials Science →  Materials Chemistry
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