JOURNAL ARTICLE

Parallel micro manipulator for optical spot array alignment of maskless lithography

Zheng Yuan LiJong Yoon ChoiYong Seok IhnSang-Hoon JiJa Choon Koo

Year: 2015 Journal:   Microsystem Technologies Vol: 21 (12)Pages: 2663-2668   Publisher: Springer Science+Business Media
Keywords:
Maskless lithography Photolithography Lithography Flexibility (engineering) Computer science Photomask Process (computing) Reduction (mathematics) Computer hardware Optics Materials science Resist Optoelectronics Electron-beam lithography Nanotechnology Physics

Metrics

2
Cited By
0.30
FWCI (Field Weighted Citation Impact)
5
Refs
0.60
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Advanced Measurement and Metrology Techniques
Physical Sciences →  Engineering →  Mechanical Engineering
Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Robotic Mechanisms and Dynamics
Physical Sciences →  Engineering →  Control and Systems Engineering

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