Parallel micro manipulator for optical spot array alignment of maskless lithography

Zheng Yuan Li; Jong Yoon Choi; Yong Seok Ihn; Sang-Hoon Ji; Ja Choon Koo

doi:10.1007/s00542-015-2520-9

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Parallel micro manipulator for optical spot array alignment of maskless lithography

Zheng Yuan Li Jong Yoon Choi Yong Seok Ihn Sang-Hoon Ji Ja Choon Koo

Year: 2015 Journal: Microsystem Technologies Vol: 21 (12)Pages: 2663-2668 Publisher: Springer Science+Business Media

DOI: 10.1007/s00542-015-2520-9

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Keywords:

Maskless lithography Photolithography Lithography Flexibility (engineering) Computer science Photomask Process (computing) Reduction (mathematics) Computer hardware Optics Materials science Resist Optoelectronics Electron-beam lithography Nanotechnology Physics

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Advanced Measurement and Metrology Techniques

Physical Sciences → Engineering → Mechanical Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Robotic Mechanisms and Dynamics

Physical Sciences → Engineering → Control and Systems Engineering

Parallel micro manipulator for optical spot array alignment of maskless lithography

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