Yong Dan ZhuCheng HuAn You Zuo
we report reproducible resistive switching performance and relevant physical mechanism of Pt/La 0.7 Sr 0.3 MnO 3 /Nb 0.05 Bi 0.95 FeO 3 /Nb:SrTiO 3 ferroelectric heterostructure which was fabricated by pulsed laser deposition. This device exhibits a nonvolatile resistive switching with a resistance ratio of up to 60 under 2V/-3V pulse voltages at room temperature. Low voltage readout, reliable resistance switching reproducibility and good time retention, indicating promise for non-destructive readout nonvolatile memories. In this metal/p-semiconductor/ferroelectric/n-semiconductor heterostructure, the mechanism of resistive switching behavior would be attributed to the ferroelectric polarization enhanced field-induced charge redistribution at the semiconductor/ferroelectric interface, resulting in the modulation of the interface barrier height. Keywords: Resistive switching, Ferroelectric resistive switching, Ferroelectric field effect.
Takeshi MurataTomoyuki TeraiTakashi FukudaTomoyuki KakeshitaK. Kishio
G. A. OvsyannikovK. Y. ConstantinianG. D. UlevA. V. ShadrinP. V. LegaА. П. Орлов
N.M. NemesC. VisaniJ. Garcia-BarriocanalF.Y. BrunoZ. SefriouiD. AriasC. LeonMar Garcia-HernandezS.G.E. Te VelthuisA. HoffmannJ. Santamaría
A. M. PetrzhikYury KhaydukovL. MustafaV. V. DemidovG. A. Ovsyannikov