JOURNAL ARTICLE

Three-dimensional discharge simulation of inductively coupled plasma (ICP) etching reactor

Yiran AnYijia LuDongSan LiYaosong Chen

Year: 2008 Journal:   Science in China. Series E, Technological sciences/Science in China. Series E, Technological Sciences Vol: 51 (6)Pages: 674-682
Keywords:
Inductively coupled plasma Microelectronics Plasma Etching (microfabrication) Materials science Electron density Plasma etching Electron temperature Deposition (geology) Analytical Chemistry (journal) Inductively coupled plasma atomic emission spectroscopy Electromagnetic coil Nuclear engineering Chemistry Optoelectronics Electrical engineering Engineering Composite material Physics Nuclear physics Geology

Metrics

5
Cited By
1.14
FWCI (Field Weighted Citation Impact)
13
Refs
0.83
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Plasma Diagnostics and Applications
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Electrohydrodynamics and Fluid Dynamics
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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