The interest in extremely small solid-state devices and high-density data storage has increased rapidly. To realize such applications, new techniques for fabricating nanometer-scale structures are important, because the conventional optical lithography has an insufficient resolution limited by the wavelength of the light and the numerical aperture of the lenses.
Weijie WangMing Hui HongDongjiang WuYeow W. GohYu-Hsin LinP. LuoBoris Luk’yanchukYongfeng LuTow Chong Chong
Dušan PudišIvan MartinčekIvan TurekMiroslav MichalkaJaroslav KováčV. GottschalchDaniel Káčik
Nicoletta GranchiFrancesca IntontiMassimo Gurioli