Fabric Defect Detection Method Based on Gabor Filter Mask

Abstract

In this paper, a fabric defect detection method based on Gabor filter masks is proposed. In this method, one even symmetric Gabor filter mask and one odd symmetric Gabor filter mask derived from the impulse response of the optimal Gabor filter are used. The optimal Gabor filter is designed to match with the texture features of defect-free fabric image, whose parameters are obtained by using the genetic algorithm. The performance of the proposed method is evaluated off-line by using a group of fabric sample images containing many kinds of fabric defects. The experimental results exhibit its accurate defect detection with low false alarms. And the effectiveness and robustness of the proposed method are confirmed.