In situ measurements of stress evolution in silicon thin films during electrochemical lithiation and delithiation

Vijay A. Sethuraman; Michael J. Chon; Maxwell Shimshak; Venkat Srinivasan; Pradeep R. Guduru

doi:10.1016/j.jpowsour.2010.02.013

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In situ measurements of stress evolution in silicon thin films during electrochemical lithiation and delithiation

Vijay A. Sethuraman Michael J. Chon Maxwell Shimshak Venkat Srinivasan Pradeep R. Guduru

Year: 2010 Journal: Journal of Power Sources Vol: 195 (15)Pages: 5062-5066 Publisher: Elsevier BV

DOI: 10.1016/j.jpowsour.2010.02.013

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Keywords:

In situ Electrochemistry Silicon Materials science Stress (linguistics) Thin film Chemical engineering Nanotechnology Electrode Chemistry Metallurgy Engineering Physical chemistry Organic chemistry

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Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advancements in Battery Materials

Physical Sciences → Engineering → Electrical and Electronic Engineering

In situ measurements of stress evolution in silicon thin films during electrochemical lithiation and delithiation

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