Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition

Liang Fang; Mingrong Shen

doi:10.1016/s0040-6090(03)00825-3

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Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition

Liang Fang Mingrong Shen

Year: 2003 Journal: Thin Solid Films Vol: 440 (1-2)Pages: 60-65 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(03)00825-3

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Keywords:

Pulsed laser deposition Materials science Thin film Dielectric Substrate (aquarium) Deposition (geology) Epitaxy High-κ dielectric Oxide Carbon film Analytical Chemistry (journal) Composite material Optoelectronics Nanotechnology Layer (electronics) Metallurgy Chemistry

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Dielectric properties of ceramics

Physical Sciences → Materials Science → Materials Chemistry

Ferroelectric and Piezoelectric Materials

Physical Sciences → Materials Science → Materials Chemistry

Microwave Dielectric Ceramics Synthesis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition

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