Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride from Novel Organosilanes

J. M. Grow; R. Lévy; Yoseb Yu; K. Shih

doi:10.1557/proc-344-241

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Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride from Novel Organosilanes

J. M. Grow R. Lévy Yoseb Yu K. Shih

Year: 1994 Journal: MRS Proceedings Vol: 344 Publisher: Cambridge University Press

DOI: 10.1557/proc-344-241

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Keywords:

Materials science Chemical vapor deposition Silicon nitride Plasma-enhanced chemical vapor deposition Chemical engineering Carbon nitride Deposition (geology) Modulus Plasma processing Silicon Carbon film Carbon fibers Combustion chemical vapor deposition Nitride Thin film Analytical Chemistry (journal) Plasma Composite material Nanotechnology Metallurgy Organic chemistry Layer (electronics) Composite number Chemistry

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Advanced ceramic materials synthesis

Physical Sciences → Materials Science → Ceramics and Composites

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride from Novel Organosilanes

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