Atmospheric-pressure plasma CVD of TiO₂photocatalytic films using surface dielectric barrier discharge

Abstract

Surface dielectric barrier discharge (DBD) was used for atmospheric-pressure plasma CVD of TiO2 films from TiCl4 and O2 for the first time. Under this experiment, the deposition rate was estimated at 22 nm min−1 by scanning electron microscope observation and the as-deposited TiO2 films were amorphous as evidenced by Raman analysis. The photocatalytic application of TiO2 films in removing HCHO from simulated air was examined in a continuous flow reactor. The TiO2 films after calcination at 350 or 450 °C were notably photocatalytically active for complete oxidation of formaldehyde to an innocuous product (CO2), which was consistent with the results of Raman analysis. Using the TiO2 films, an extremely harmful by-product, CO, was not detected from photocatalytic oxidation of HCHO in a simulated air stream.