&lt;title&gt;SCALPEL mask blank fabrication&lt;/title&gt;

Thomas E. Saunders; Myrtle I. Blakey; Carlos Caminos; Gregory R. Bogart; R. C. Farrow; Chester S. Knurek; A. Kornblit; J. Alexander Liddle; Anthony E. Novembre; Milton L. Peabody

doi:10.1117/12.361228

JOURNAL ARTICLE

<title>SCALPEL mask blank fabrication</title>

Thomas E. Saunders Myrtle I. Blakey Carlos Caminos Gregory R. Bogart R. C. Farrow Chester S. Knurek A. Kornblit J. Alexander Liddle Anthony E. Novembre Milton L. Peabody

Year: 1999 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 3874 Pages: 248-255 Publisher: SPIE

DOI: 10.1117/12.361228

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Abstract

The SCALPEL lithography system combines the advantages of high resolution and wide process latitude of electron beam lithography with the throughput of a projection system. The SCALPEL approach has the potential to meet the minimum feature size requirements of future IC generations down to 50 nm.

Keywords:

Blank Lithography Electron-beam lithography Fabrication Throughput Resist Projection (relational algebra) Computer science Process (computing) Materials science X-ray lithography Next-generation lithography Optics Optoelectronics Nanotechnology Physics Telecommunications Algorithm

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Topics

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

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