NiCr Thin Film Strain Gauges Fabricated on Glass Substrates

Abstract

Abstract In order to investigate the strain gauge characteristics of NiCr thin films, 500 nm NiCr (80 wt.-% and 20 wt.-%, respectively) thin films were deposited on glass substrates by DC magnetron sputtering. After deposition, NiCr thin films were characterized by using X-Ray diffraction analysis, scanning electron microscope and four-point probe techniques inview of crystallization, phases, film structure and electrical resistivity. After characterization, NiCr thin films were shaped into strain gauges by photo lithography and wet etching techniques. Strain gauges were tested with different loads, and strain values were calculated by comparing the results with commercial NiCr strain gauges with the same surface area. Resistivity change vs. strain was plotted, and the gauge factor of fabricated thin film strain gauges was evaluated as 1.23.