Maskless Direct Write Grayscale Lithography for MEMS Applications

C. M. McKenna; Kevin Walsh; Mark M. Crain; Joseph Lake

doi:10.1109/ugim.2010.5508906

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Maskless Direct Write Grayscale Lithography for MEMS Applications

C. M. McKenna Kevin Walsh Mark M. Crain Joseph Lake

Year: 2010 Pages: 1-4

DOI: 10.1109/ugim.2010.5508906

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Abstract

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Keywords:

Grayscale Photoresist Lithography Maskless lithography Materials science Resist Binary number X-ray lithography Optics Computer science Electron-beam lithography Optoelectronics Artificial intelligence Nanotechnology Pixel Physics Mathematics

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Surface Polishing Techniques

Physical Sciences → Engineering → Biomedical Engineering

Maskless Direct Write Grayscale Lithography for MEMS Applications

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