JOURNAL ARTICLE
Deep RIE Process for Silicon Carbide Power Electronics and MEMS
Year: 2000 Journal: MRS Proceedings Vol: 622 Publisher: Cambridge University Press
Keywords:
Materials science Microelectromechanical systems Silicon carbide Reactive-ion etching Deep reactive-ion etching Fabrication Etching (microfabrication) Optoelectronics Inductively coupled plasma Silicon Nanotechnology Plasma Composite material Layer (electronics)
Metrics
37
Cited By
4.19
FWCI (Field Weighted Citation Impact)
4
Refs
0.95
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Plasma Diagnostics and Applications
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Carbide Semiconductor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
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