JOURNAL ARTICLE

Rapid Thermal Annealing for Residual-Stress Relaxation in Undoped or Doped Polysilicon Thin Films

Xin ZhangTong‐Yi ZhangYitshak Zohar

Year: 1998 Journal:   MRS Proceedings Vol: 546   Publisher: Cambridge University Press
Keywords:
Materials science Residual stress Wafer Microstructure Composite material Stress relaxation Doping Annealing (glass) Thin film Optoelectronics Nanotechnology Creep

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Topics

Advanced Surface Polishing Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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