Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition

Yasuaki Hayashi; Takuya Fukumura; Kazunori Odani; Teruaki Matsuba; Risa Utsunomiya

doi:10.1016/j.tsf.2009.11.028

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Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition

Yasuaki Hayashi Takuya Fukumura Kazunori Odani Teruaki Matsuba Risa Utsunomiya

Year: 2009 Journal: Thin Solid Films Vol: 518 (13)Pages: 3506-3508 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2009.11.028

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Keywords:

Carbon nanotube Chemical vapor deposition FOIL method Materials science Plasma Plasma-enhanced chemical vapor deposition Nanotechnology Deposition (geology) Chemical engineering Analytical Chemistry (journal) Chemistry Composite material Environmental chemistry

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Carbon Nanotubes in Composites

Physical Sciences → Materials Science → Materials Chemistry

Graphene research and applications

Physical Sciences → Materials Science → Materials Chemistry

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition

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