Advanced channel and contact technologies for future CMOS devices

Yee‐Chia Yeo

doi:10.1109/vlsi-tsa.2012.6210144

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JOURNAL ARTICLE

Advanced channel and contact technologies for future CMOS devices

Yee‐Chia Yeo

Year: 2012 Vol: 56 Pages: 1-2

DOI: 10.1109/vlsi-tsa.2012.6210144

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Abstract

10.1109/VLSI-TSA.2012.6210144

Keywords:

CMOS Contact resistance Channel (broadcasting) Electrical engineering Transistor Strain engineering Computer science Electronic engineering Materials science Optoelectronics Engineering Nanotechnology Silicon

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Advancements in Semiconductor Devices and Circuit Design

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced channel and contact technologies for future CMOS devices

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