JOURNAL ARTICLE

Mechanism of reverse-offset printing

Young‐Man ChoiEonseok LeeTaik‐Min Lee

Year: 2015 Journal:   Journal of Micromechanics and Microengineering Vol: 25 (7)Pages: 075019-075019   Publisher: IOP Publishing

Abstract

We propose a mechanism for reverse-offset printing based on a mathematical model. In reverse-offset printing, high resolution is achieved by patterning a coated, thin ink film with an intaglio-patterned cliché. By using the relationships among the ink blanket adhesion strength, the ink cliché adhesion strength, and the ink cohesion strength, a criterion for successful patterning is derived. We found that there is a printing window in the ink blanket adhesion strength that depends on the shear strength of the ink film and the dimensions of the pattern. The printing window diminishes as the line width decreases, resulting in a minimum printable line width. The proposed mechanism was verified by printing patterns with various shapes and dimensions.

Keywords:
Offset printing Inkwell Materials science Blanket Line width Cohesion (chemistry) Offset (computer science) Composite material Adhesion Nanotechnology Computer science Optics Chemistry Physics

Metrics

41
Cited By
2.97
FWCI (Field Weighted Citation Impact)
17
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Nanomaterials and Printing Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Photonic Crystals and Applications
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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