Millimeter Resonance Isolator Using Chemically Deposited Ferrite Films (Correspondence)

William L. Wade; T. Collins; Richard A. Stern

doi:10.1109/tmtt.1962.1125576

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Millimeter Resonance Isolator Using Chemically Deposited Ferrite Films (Correspondence)

William L. Wade T. Collins Richard A. Stern

Year: 1962 Journal: IRE Transactions on Microwave Theory and Techniques Vol: 10 (6)Pages: 611-611 Publisher: Institute of Electrical and Electronics Engineers

DOI: 10.1109/tmtt.1962.1125576

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Abstract

An experimental resonanre isolator showing the feasibility of newly developed chemically deposited ferrite films, was made in the 35-Gc region. Included in this letter are two graphs showing the isolation characteristics that were obtained and also a brief description of the film preparation techniques.

Keywords:

Isolator Ferrite (magnet) Millimeter Materials science Composite material Optoelectronics Optics Physics Electronic engineering Engineering

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Magneto-Optical Properties and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Photonic Crystals and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Millimeter Resonance Isolator Using Chemically Deposited Ferrite Films (Correspondence)

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