Properties of RF magnetron sputtered zinc oxide thin films

Roger Ondo-Ndong; G. Ferblantier; M. Al Kalfioui; A. Boyer; A. Foucaran

doi:10.1016/s0022-0248(03)01243-0

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Properties of RF magnetron sputtered zinc oxide thin films

Roger Ondo-Ndong G. Ferblantier M. Al Kalfioui A. Boyer A. Foucaran

Year: 2003 Journal: Journal of Crystal Growth Vol: 255 (1-2)Pages: 130-135 Publisher: Elsevier BV

DOI: 10.1016/s0022-0248(03)01243-0

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Keywords:

Materials science Thin film Argon Crystallinity Sputter deposition Sputtering Torr Cavity magnetron Zinc Substrate (aquarium) Analytical Chemistry (journal) Oxygen Electrical resistivity and conductivity Optoelectronics Metallurgy Composite material Chemistry Nanotechnology Electrical engineering

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Properties of RF magnetron sputtered zinc oxide thin films

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