Jingyu ZouChang‐Zhi LiChih‐Yu ChangHin‐Lap YipAlex K.‐Y. Jen
A generally applicable method has been developed for fabricating highly transparent ultrathin Ag films on both glass and plastic substrates using the self-assembled monolayer modified ZnO/Ag/ZnO tri-layer structure. The resulting films show remarkably low surface roughness with very high transparency (>80% between 400 and 600 nm) and low surface resistance (8.61 Ω/□). With an inverted architecture, the devices based on the SAM modified tri-layer UTMF electrode show superior performance and mechanical properties than those using ITO electrode on both glass and plastic substrates. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Yuanhe WangXinyi LiShihao LiuLetian ZhangWenfa Xie
Seok Je LeeMyungchan AnJae Yoon KimHyeong Woo BaeChul Gyu Jhun
Fengyuan LinXingyuan LiuYantao LiYongsheng HuXiaoyang Guo
Yuniu ZhangJiawei ZhengZhengyan JiangXinjun HeJinwook KimLuhang XuMinchao QinXinhui LuAung Ko Ko KyawWallace C. H. Choy
J.C. BérnèdeDuc Tuong NguyenL. CattinM. MorsliS.R.B. KanthSatish Patil