JOURNAL ARTICLE

Co,Ni-base alloy thin films deposited by reactive radio frequency magnetron sputtering

Paolo ScardiYuhui DongC. Tosi

Year: 2001 Journal:   Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Vol: 19 (5)Pages: 2394-2399   Publisher: American Institute of Physics

Abstract

Structural properties and mechanical behavior of Co,Ni-base alloy thin films deposited by reactive rf magnetron sputtering on a tool steel were compared with those of TiN or TiN/Ti two-layer coatings produced by the same technology. Reactive sputtering of the Co,Ni-base alloy in Ar+N2 atmosphere results in the production of amorphous (or nanocrystalline) thin films with interesting properties: (a) high hardness (2000 HV), (b) low friction coefficient (0.06), and (c) absence of acoustic emission and no delamination after scratch test up to a load of 60 N. The strong adhesion to the steel substrate is directly connected with the plastic behavior of these thin films, which is a rather unusual feature for hard, low-friction nitride coatings.

Keywords:
Materials science Nanocrystalline material Sputtering Thin film Sputter deposition Tin Metallurgy Alloy Amorphous solid Nitride Nanoindentation Substrate (aquarium) Composite material Layer (electronics) Chromium nitride Nanotechnology Crystallography

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7
Cited By
0.68
FWCI (Field Weighted Citation Impact)
19
Refs
0.74
Citation Normalized Percentile
Is in top 1%
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Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Diamond and Carbon-based Materials Research
Physical Sciences →  Materials Science →  Materials Chemistry
Boron and Carbon Nanomaterials Research
Physical Sciences →  Materials Science →  Materials Chemistry

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