Titanium dioxide thin films prepared by chemical vapor deposition

Toshiro Maruyama; Susumu Arai

doi:10.1016/0927-0248(92)90051-p

ScienceGate Book Chapters

JOURNAL ARTICLE

Titanium dioxide thin films prepared by chemical vapor deposition

Toshiro Maruyama Susumu Arai

Year: 1992 Journal: Solar Energy Materials and Solar Cells Vol: 26 (4)Pages: 323-329 Publisher: Elsevier BV

DOI: 10.1016/0927-0248(92)90051-p

Get Full-Text PDF Get Analytical Report

Keywords:

Anatase Thin film Titanium dioxide Chemical vapor deposition Isopropyl alcohol Materials science Substrate (aquarium) Titanium Amorphous solid Combustion chemical vapor deposition Deposition (geology) Chemical engineering Atmospheric temperature range Silicon Inorganic chemistry Carbon film Chemistry Nanotechnology Composite material Metallurgy Photocatalysis Catalysis Organic chemistry

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.20

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced Photocatalysis Techniques

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Titanium dioxide thin films prepared by chemical vapor deposition

Metrics

Citation History

Topics

Related Documents

Chemical Vapor Deposition to Titanium Dioxide Thin Films.

Photocatalytic and optical properties of titanium dioxide thin films prepared by metalorganic chemical vapor deposition

Fluorine-doped tin dioxide thin films prepared by chemical vapor deposition

Pure Anatase Phase Titanium Dioxide Films Prepared by Mist Chemical Vapor Deposition

Silicon Dioxide Thin Films Prepared by Chemical Vapor Deposition from Silicon Tetraacetate