JOURNAL ARTICLE
Raman scattering studies in glow discharge deposited a-Si:H films: Effect of argon dilution
S. T. KshirsagarN. R. KhaladkarJ. B. MamdapurkarAmitabha Sinha
Year: 1987 Journal: Materials Chemistry and Physics Vol: 16 (5-6)Pages: 433-442 Publisher: Elsevier BV
Keywords:
Silane Amorphous solid Raman spectroscopy Materials science Analytical Chemistry (journal) Silanes Argon Microcrystalline Raman scattering Amorphous silicon Silicon Glow discharge Germane Chemistry Crystalline silicon Optics Crystallography Composite material Metallurgy Plasma Organic chemistry
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Topics
Thin-Film Transistor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences → Materials Science → Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
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