JOURNAL ARTICLE

Residual stresses and microstructure of Ag-Ni multilayers

K. F. BadawiNicolas DurandP. GoudeauV. Pélosin

Year: 1994 Journal:   Applied Physics Letters Vol: 65 (24)Pages: 3075-3077   Publisher: American Institute of Physics

Abstract

A direct determination of residual stresses in very-low-period Ag-Ni multilayers has been performed by x-ray diffraction using the sin2ψ method. Stresses in silver layers as thin as three atomic planes and in nickel layers as thin as four atomic planes could be determined. They range from −3.07 to 0.522 GPa, and their genesis excludes any interfacial coherency relationship. The variation of the multilayer microstructure with respect to the period has been studied by measurement of the stress free lattice parameter and microdistortions. Important deviations with respect to the bulk microstructure have been observed and discussed.

Keywords:
Microstructure Residual stress Materials science Diffraction Thin film Nickel Lattice (music) Composite material Lattice constant X-ray crystallography Metallurgy Crystallography Analytical Chemistry (journal) Optics Nanotechnology Chemistry

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Citation History

Topics

Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Copper Interconnects and Reliability
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
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