JOURNAL ARTICLE

Electroless deposition of CoO thin films

F. C. Eze

Year: 1999 Journal:   Journal of Physics D Applied Physics Vol: 32 (5)Pages: 533-540   Publisher: Institute of Physics

Abstract

The influence of various preparation conditions such as bath composition, film growth and heat treatment conditions on the properties of chemical bath deposited cobalt II oxide thin films has been studied. The interference fringes on the transmission spectra were used to calculate the refractive index and the average thickness of the films. The effects of surface roughness of the films on the interference extrema are also analysed. The maximum film thickness obtainable in a single deposition cycle is about 700 nm. X-ray diffractometry, energy-dispersive analysis of x-ray fluorescence and electrical resistivity measurements were also used for the characterization of the films. The properties of the deposited films are similar to those of hot-sprayed and sol-gel and baked films but film deposition is simpler and more cost effective than via solution growth procedures.

Keywords:
Materials science Thin film Deposition (geology) Electrical resistivity and conductivity Surface finish Refractive index Surface roughness Cobalt oxide Analytical Chemistry (journal) Cobalt Oxide Carbon film Optics Chemical engineering Composite material Nanotechnology Metallurgy Optoelectronics Chemistry

Metrics

12
Cited By
0.38
FWCI (Field Weighted Citation Impact)
26
Refs
0.59
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Transition Metal Oxide Nanomaterials
Physical Sciences →  Materials Science →  Polymers and Plastics
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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