Vacuum–ultraviolet pulsed-laser deposition of silicon dioxide thin films

B. D. Jackson; Peter R. Herman

doi:10.1016/s0169-4332(97)00712-5

ScienceGate Book Chapters

JOURNAL ARTICLE

Vacuum–ultraviolet pulsed-laser deposition of silicon dioxide thin films

B. D. Jackson Peter R. Herman

Year: 1998 Journal: Applied Surface Science Vol: 127-129 Pages: 595-600 Publisher: Elsevier BV

DOI: 10.1016/s0169-4332(97)00712-5

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Fluence Pulsed laser deposition Analytical Chemistry (journal) Thin film Laser Ultraviolet X-ray photoelectron spectroscopy Silicon Torr Laser ablation Doping Optoelectronics Optics Chemistry Nanotechnology

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.17

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Vacuum–ultraviolet pulsed-laser deposition of silicon dioxide thin films

Metrics

Citation History

Topics

Related Documents

Vacuum ultraviolet annealing of thin films grown by pulsed laser deposition

Femtosecond pulsed laser deposition of silicon thin films

Pulsed Laser Deposition of Thin Silicon Nitride Films

Ultraviolet-assisted pulsed laser deposition of thin oxide films

Ultraviolet Assisted Pulsed Laser Deposition of Thin Oxide Films