Preparation of Indium Zinc Oxide Thin Films Deposited on Various Substrates

Abstract

The amorphous indium zinc oxide (IZO) thin films were deposited on polycarbonate (PC), polyethersulfone (PES) and glass substrates at room temperature using the facing targets sputtering (FTS). The electrical, optical, structural characteristics of IZO thin films were evaluated by a Hall Effect Measurement, an X-Ray Diffractormeter (XRD), a UV/VIS spectrometer in visible range and an atomic force microscopy (AFM), respectively. As-deposited IZO thin films exhibited the resistivity of 5.1 × 10−4, 5.1 × 10−4, and 4.9 × 10−4 [Ω-cm] on PC, PES and glass substrates, respectively. The optical transmittance showed over 85% in the visible region, regardless of substrate type.