Faceting induced by ultrathin metal films: structure, electronic properties and reactivity

Theodore E. Madey; C.-H. Nien; Kalman Pelhos; J. Kołodziej; Ihab M. Abdelrehim; H.-S. Tao

doi:10.1016/s0039-6028(99)00570-1

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Faceting induced by ultrathin metal films: structure, electronic properties and reactivity

Theodore E. Madey C.-H. Nien Kalman Pelhos J. Kołodziej Ihab M. Abdelrehim H.-S. Tao

Year: 1999 Journal: Surface Science Vol: 438 (1-3)Pages: 191-206 Publisher: Elsevier BV

DOI: 10.1016/s0039-6028(99)00570-1

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Keywords:

Faceting Overlayer Low-energy electron diffraction Auger electron spectroscopy Scanning tunneling microscope Materials science X-ray photoelectron spectroscopy Annealing (glass) Electron energy loss spectroscopy Surface energy Crystallography Electron diffraction Thin film Electron spectroscopy Nanotechnology Chemistry Diffraction Transmission electron microscopy Optics Chemical engineering Physical chemistry Metallurgy

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Advanced Chemical Physics Studies

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Chemical and Physical Properties of Materials

Physical Sciences → Materials Science → Materials Chemistry

Surface and Thin Film Phenomena

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Faceting induced by ultrathin metal films: structure, electronic properties and reactivity

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