EUV wavefront metrology system in EUVA

T. Hasegawa; Chidane Ouchi; Masanobu Hasegawa; Seima Kato; Akiyoshi Suzuki; Katsumi Sugisaki; Katsuhiko Murakami; Jun Saito; Masahito Niibe

doi:10.1117/12.536327

JOURNAL ARTICLE

EUV wavefront metrology system in EUVA

T. Hasegawa Chidane Ouchi Masanobu Hasegawa Seima Kato Akiyoshi Suzuki Katsumi Sugisaki Katsuhiko Murakami Jun Saito Masahito Niibe

Year: 2004 Journal: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 5374 Pages: 797-797 Publisher: SPIE

DOI: 10.1117/12.536327

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Abstract

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

Keywords:

Extreme ultraviolet lithography Metrology Optics Extreme ultraviolet Wavefront Undulator Interferometry Lithography Physics Synchrotron Laser

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Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Advanced X-ray Imaging Techniques

Physical Sciences → Physics and Astronomy → Radiation

Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

EUV wavefront metrology system in EUVA

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