Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Jianrong Xiao; Yanwei Li; Aihua Jiang

doi:10.1016/s1005-0302(11)60082-0

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JOURNAL ARTICLE

Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

Jianrong Xiao Yanwei Li Aihua Jiang

Year: 2011 Journal: Journal of Material Science and Technology Vol: 27 (5)Pages: 403-407 Publisher: Elsevier BV

DOI: 10.1016/s1005-0302(11)60082-0

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Keywords:

Materials science Lattice constant Analytical Chemistry (journal) Nitride Partial pressure Thermal stability Copper Band gap Sputter deposition Sputtering Thin film Thermogravimetry Thermal decomposition Diffraction Composite material Chemical engineering Optics Optoelectronics Metallurgy Nanotechnology Layer (electronics) Chemistry Oxygen Organic chemistry

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Copper-based nanomaterials and applications

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Structure, Optical Property and Thermal Stability of Copper Nitride Films Prepared by Reactive Radio Frequency Magnetron Sputtering

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