Structural characterization of sputtered indium oxide films deposited at room temperature

Ivan Hotový; J. Pezoldt; Magdaléna Kadlěčíková; Thomas Kups; Lothar Spieß; Juraj Breza; E. Sakalauskas; R. Goldhahn; V. Řeháček

doi:10.1016/j.tsf.2009.12.018

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Structural characterization of sputtered indium oxide films deposited at room temperature

Ivan Hotový J. Pezoldt Magdaléna Kadlěčíková Thomas Kups Lothar Spieß Juraj Breza E. Sakalauskas R. Goldhahn V. Řeháček

Year: 2009 Journal: Thin Solid Films Vol: 518 (16)Pages: 4508-4511 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2009.12.018

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Keywords:

Indium Annealing (glass) Nanocrystalline material Materials science Crystallinity Oxide Sputtering Indium tin oxide Thin film Sputter deposition Argon Grain size Analytical Chemistry (journal) Chemical engineering Metallurgy Inorganic chemistry Nanotechnology Chemistry Composite material

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ZnO doping and properties

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Ga2O3 and related materials

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Structural characterization of sputtered indium oxide films deposited at room temperature

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