X-ray photoelectron spectroscopic study of Si(111) oxidation promoted by potassium multilayers under low O2 pressures

B. Lamontagne; F. Sèmond; Denis Roy

doi:10.1016/0368-2048(94)02287-9

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X-ray photoelectron spectroscopic study of Si(111) oxidation promoted by potassium multilayers under low O2 pressures

B. Lamontagne F. Sèmond Denis Roy

Year: 1995 Journal: Journal of Electron Spectroscopy and Related Phenomena Vol: 73 (1)Pages: 81-88 Publisher: Elsevier BV

DOI: 10.1016/0368-2048(94)02287-9

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Keywords:

Overlayer Potassium X-ray photoelectron spectroscopy Chemistry Oxygen Diffusion Alkali metal Silicon Metal Context (archaeology) Inorganic chemistry Analytical Chemistry (journal) Physical chemistry Chemical engineering Environmental chemistry Thermodynamics Organic chemistry

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Electron and X-Ray Spectroscopy Techniques

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Integrated Circuits and Semiconductor Failure Analysis

Physical Sciences → Engineering → Electrical and Electronic Engineering

X-ray photoelectron spectroscopic study of Si(111) oxidation promoted by potassium multilayers under low O2 pressures

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