JOURNAL ARTICLE

<title>New holographic recording materials based on dual-cure photopolymer systems</title>

Daniel‐Joseph LougnotColette TurckC. Leroy-Garel

Year: 1998 Journal:   Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Vol: 3417 Pages: 165-171   Publisher: SPIE

Abstract

The limitation of the holographic sensitivity of photopolymer materials mostly result from an imbalance between photocrosslinking copolymerization and mass transfer processes. The development of new blends containing acrylate and vinyl ether monomers which undergo hybrid-cure polymerization, makes it possible to evade some of the typical shortcomings of multiacrylate formulations resulting thereof. Self-processing materials exhibiting an holographic sensitivity of up to 200 cm2/J and an energetic sensitivity below 20 mJ/cm2 are reported. The improvement of the reciprocity between exposure and holographic intensity opens up attractive prospects for applications requiring holographic exposure shorter than 0.5 second.

Keywords:
Photopolymer Holography Copolymer Polymerization Acrylate Materials science Monomer Polymer chemistry Polymer science Optics Polymer Composite material Physics

Metrics

5
Cited By
0.00
FWCI (Field Weighted Citation Impact)
2
Refs
0.16
Citation Normalized Percentile
Is in top 1%
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Topics

Photopolymerization techniques and applications
Physical Sciences →  Chemistry →  Organic Chemistry
Photorefractive and Nonlinear Optics
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Advanced Optical Imaging Technologies
Physical Sciences →  Engineering →  Media Technology

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