JOURNAL ARTICLE

Chemical Vapor Deposition of Mo onto Si

James CaseyR.R. VerderberR. R. Garnache

Year: 1967 Journal:   Journal of The Electrochemical Society Vol: 114 (2)Pages: 201-201   Publisher: Institute of Physics

Abstract

Molybdenum has been deposited on single crystal silicon substrates by the vapor phase decomposition of molybdenum chlorides. The thickness, alloy phase, and crystalline nature of the films were studied as functions of substrate temperature, substrate orientation, and source material, using electron microscopy and reflection electron diffraction.

Keywords:
Molybdenum Chemical vapor deposition Materials science Substrate (aquarium) Silicon Electron diffraction Chemical engineering Alloy Phase (matter) Deposition (geology) Decomposition Electron microscope Reflection (computer programming) Scanning electron microscope Diffraction Analytical Chemistry (journal) Chemistry Nanotechnology Metallurgy Optics Composite material Organic chemistry

Metrics

21
Cited By
0.73
FWCI (Field Weighted Citation Impact)
1
Refs
0.69
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Surface and Thin Film Phenomena
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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