Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering

Masanobu Futsuhara; Katsuaki Yoshioka; Osamu Takai

doi:10.1016/s0040-6090(97)00910-3

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Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering

Masanobu Futsuhara Katsuaki Yoshioka Osamu Takai

Year: 1998 Journal: Thin Solid Films Vol: 322 (1-2)Pages: 274-281 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(97)00910-3

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Keywords:

X-ray photoelectron spectroscopy Analytical Chemistry (journal) Sputtering Crystallite Thin film Sputter deposition Materials science Auger electron spectroscopy Nitride Chemical state Texture (cosmology) Cavity magnetron Chemistry Nanotechnology Metallurgy Layer (electronics) Nuclear magnetic resonance

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering

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