<title>Universal pattern data format</title>

Abstract

This paper will discuss a new universal format for representing the pattern data and other information which define integrated circuits and the process of making them. The format, and the applications to be built around it, are designed to greatly save in cost, reduce production time, eliminate errors, and simplify procedures. It is called a `universal' format because the pattern data for a mask or a wafer can be encoded independently of the method of manufacturing it, and all tools can access the same data file without data conversion. The format encompasses all aspects of production, including mask layout, critical dimensions, e- beam and optical stepper proximity corrections, phase shift masks, and overlap removal. This paper discusses technology for connecting the universal format data in real time to high-speed tools for lithography (both raster and shaped beam technologies) and inspection.