JOURNAL ARTICLE
Characterization of ohmic and Schottky contacts on SiC
A. Kakanakova‐GeorgievaTs. MarinovaO. NoblancC. ArnodoS. CassetteC. Brylinski
Year: 1999 Journal: Thin Solid Films Vol: 343-344 Pages: 637-641 Publisher: Elsevier BV
Keywords:
Ohmic contact Annealing (glass) Materials science X-ray photoelectron spectroscopy Schottky barrier Tungsten Schottky diode Inert Nickel Contact resistance Silicon carbide Analytical Chemistry (journal) Chemical engineering Layer (electronics) Metallurgy Nanotechnology Chemistry Optoelectronics
Metrics
40
Cited By
2.73
FWCI (Field Weighted Citation Impact)
10
Refs
0.91
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Silicon Carbide Semiconductor Technologies
Physical Sciences → Engineering → Electrical and Electronic Engineering
Semiconductor materials and interfaces
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Aluminum Alloys Composites Properties
Physical Sciences → Engineering → Mechanical Engineering
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