Holographic reverse shearing interferometry with high measurement sensitivity

Abstract

The possibility of studying phase objects by reverse shearing interferometry with high measurement sensitivity is demonstrated. Phase objects are studied in two stages. In the first stage, holographic reverse shear interferograms are measured with and without an object under nonlinear conditions with tuning to frequent reference fringes. In the next stage, these interferograms are optically processed to obtain two interference patterns. The behavior of the interference fringes is the same as in the case of conventional double-beam interferometry with a standard reference wave. The increase in the measurement sensitivity in the thus-obtained interference patterns is due to the use of higher diffraction orders reconstructed from the holographic interferograms. A possibility of controlling the width of interference fringes is considered. The results of experimental approval of this technique are presented.