Z. H. LiuGeok Ing NgS. ArulkumaranY. K. T. MaungHong Zhou
The mechanisms of the temperature-dependent forward gate current transport in the atomic-layer-deposited Al2O3/AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor (MISHEMT) were investigated. In contrast to the conventional Schottky-gate AlGaN/GaN HEMT, thermionic field emission was found not to be the dominant transport mechanism for the Al2O3/AlGaN/GaN MISHEMT. Fowler–Nordheim tunneling was found to be dominant at low temperature (T<0 °C) and high electrical filed, whereas trap assistant tunneling was found to be dominant at medium electrical field and high temperature (T>0 °C).
Z. H. LiuGeok Ing NgS. ArulkumaranY. K. T. MaungK. L. TeoS. C. FooS. Vicknesh
P. D. YeBingzheng YangK.K. NgJ. BudeG. D. WilkSubrata HalderJames C. M. Hwang
Ya-Hsi HwangLu LiuCamilo VélezF. RenF. RenDavid C. HaysS. J. PeartonE. S. LambersIvan I. KravchenkoChien-Fong LoJ. W. Johnson
Qian FengQiang WangTao XingQian LiYue Hao