JOURNAL ARTICLE

Temperature-dependent forward gate current transport in atomic-layer-deposited Al2O3/AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor

Z. H. LiuGeok Ing NgS. ArulkumaranY. K. T. MaungHong Zhou

Year: 2011 Journal:   Applied Physics Letters Vol: 98 (16)   Publisher: American Institute of Physics

Abstract

The mechanisms of the temperature-dependent forward gate current transport in the atomic-layer-deposited Al2O3/AlGaN/GaN metal-insulator-semiconductor high electron mobility transistor (MISHEMT) were investigated. In contrast to the conventional Schottky-gate AlGaN/GaN HEMT, thermionic field emission was found not to be the dominant transport mechanism for the Al2O3/AlGaN/GaN MISHEMT. Fowler–Nordheim tunneling was found to be dominant at low temperature (T<0 °C) and high electrical filed, whereas trap assistant tunneling was found to be dominant at medium electrical field and high temperature (T>0 °C).

Keywords:
Thermionic emission Materials science High-electron-mobility transistor Optoelectronics Quantum tunnelling Schottky diode Transistor Electron mobility Semiconductor Wide-bandgap semiconductor Field-effect transistor Induced high electron mobility transistor Electron Diode Electrical engineering Voltage Physics

Metrics

83
Cited By
4.26
FWCI (Field Weighted Citation Impact)
17
Refs
0.95
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Semiconductor materials and interfaces
Physical Sciences →  Physics and Astronomy →  Atomic and Molecular Physics, and Optics

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